Description
This advanced optical system is engineered to generate a monochromatized quasi-parallel X-ray beam for superior diffraction measurements.
The assembly replaces standard optical components on the source arm, offering enhanced performance for specialized applications.
Key Features and Benefits:
- Produces an intense, monochromatic beam with minimal divergence (<0.1°)
- Eliminates Kβ radiation and reduces fluorescence background
- Maintains high beam intensity while improving angular resolution
Primary Applications:
- GIXRD – enables precise surface and thin film analysis with optimized beam geometry
- XRR – provides the required beam characteristics for accurate thin film density and thickness measurements
- Analysis of challenging samples – particularly effective for:
- Irregularly shaped polycrystalline specimens
- Rough or uneven surfaces
- Temperature-sensitive materials that cannot be ground
Technical Implementation:
The Goebel mirror design ensures constant beam geometry throughout the entire angular range, overcoming limitations of conventional
systems. This makes it ideal for measurements requiring:
- Consistent illumination of sample surfaces
- High resolution at low angles
- Minimal sample preparation
For optimal performance, we recommend pairing with a parallel-beam collimator on the detector side.
Features:
- Outgoing beam divergence: not more than 0.04°
- Parallel beam height (h): 0.61 mm
- Average reflectivity of the mirror for Kα line emission of the source with copper anode: not less than 60%
- Relative intensity of Kβ/Kα line at the output when using X-ray tube with copper anode: not more than 0.5%
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